IDE Solutions for Semiconductor Facilities
Standard Reverse Osmosis (RO) and Filtration Systems
We provide RO and filtration systems (GAC, UF, Sand Filters) to handle diverse water streams within semiconductor manufacturing processes.
Specialized Treatment for Complex Streams
For streams requiring specific treatment (such as CMP, ammonia waste, HFW plating, scrubber), we utilize a specialized treatment chain involving UF and PFRO technologies with clarifiers, focusing on reuse, reclaim, and recycle strategies.
High Recovery Reclaim Technologies
Our proprietary MaxH2O PFRO and MaxH2O Desalter systems deliver exceptional recovery rates above 90%, reduce chemical usage, enhance water reuse, lower water footprints, and facilitate efficient Zero Liquid Discharge (ZLD) implementation.
Biological Treatment with MBR (Membrane Bioreactor)
We integrate MBR technology to efficiently treat various streams, preparing them for subsequent treatment stages.
Zero Liquid Discharge (ZLD) Solutions
Essential for regulatory compliance and sustainability, our ZLD solutions, including the MaxH2O Desalter, ensure minimal environmental impact.
Meet PFAS requirements
Protect water quality, meet regulations, and implement sustainable PFAS removal with proven, high-performance technologies
Comprehensive PFAS Removal with Reverse Osmosis
IDE offers reverse osmosis (RO) because it is the most effective commercial technology for removing short-chain PFAS from drinking water and industrial wastewater. Our complete treatment solutions – from pre-treatment through polishing – also remove a wide range of other contaminants, delivering reliable results tailored to your specific water quality needs.
Achieve Over 90% Recovery with IDE’s MAXH₂O Technologies
Water recovery for PFAS removal is influenced by various factors like feed water quality, discharge limitations, and permeate requirements. IDE’s high-recovery MAXH₂O systems overcome these challenges, achieving >90% recovery while concentrating PFAS for easier destruction. These systems support compliance with local disposal regulations and enable the safe discharge of treated water post-PFAS removal.
Follow Industry Standards and Benefit from Extended Membrane Life
IDE’s systems follow industry-standard CIP (Clean-in-Place) procedures but require fewer cleaning cycles thanks to MAXH₂O’s optimized design. This reduces chemical usage and operational downtime, extends membrane lifespan, and allows for cleaning solution reuse, improving both sustainability and cost-efficiency.
To limit PFAS release into the air, our ZLD designs operate at the lowest feasible temperatures and comply with local emission monitoring and regulatory standards.
Benefit from IDE's Technologies And Their Uniqueness
- High recovery rates above 90%;
- Reduced OPEX and CAPEX compared to conventional solutions;
- Modular design capability to reduce installation time, risk and costs;
- End-to-end water treatment from pre-treatment, through membrane solutions up to Zero Liquid Discharge (ZLD).
Learn More on Water Treatment Solution for Semiconductor Facilities
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Project: Wastewater Treatment for a Semiconductor Manufacturer
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Webinar: Semiconductor OSM Strategy for Fab Water Treatment
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Blog: Why Water Sustainability is Vital for the Semiconductor Industry

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